Levitor RTP

The Levitor is a single-wafer Rapid Thermal Processing- system is based on the unique concept of conduction rather than the conventional method of radiation heating. This technology is used to rapidly heat and cool-down wafers. 

Conductive Heating

A thin gas layer enables ultra-fast heating or cooling, while the gas divider self-centers the wafer at the desired process temperature. The Levitor uses a massive gas divider, which is heated to the selected process temperature in close proximity to the wafer.  The result is very precise heat transfer that is emissivity- and layer independent.


The Levitor 4×00 RTP system for 200mm- and 300mm semiconductor wafer manufacturing, has been updated with a new process-portfolio. The Levitor RTP-system has reproducible and reliable operation at temperatures ranging from 100°C up to 1,200°C. Our new process flexibility comes in combination with the Levitor RTP systems proven unparalleled uniformity, mass-production throughput and repeatability.

the LEVO 6000 series is the next generation Rapid Thermal Processing systems capable of handling reactive gasses such as ammonia and 100% hydrogen. The leak-tightness and improved control system are the main new features of the LEVO 6000 series which continues the high throughput and reliability of the Levitor system.

More information is available here!