LEVITRACK ALD
Levitrack Atomic Layer Deposition
The Levitrack spatial Atomic Layer Deposition (s-ALD) system is designed for mass-production environments, offering ultra-thin, high-quality passivation and functional layers for next-generation crystalline and tandem silicon solar cells.
Utilizing Levitech’s proprietary gas-based wafer levitation and atmospheric spatial ALD technology, the Levitrack delivers high throughput, excellent film uniformity, and best-in-class Cost-of-Ownership.
The Levitrack can be applied in the following area’s:
- Single-side ALD deposition of Al₂O₃ for surface passivation for PERC and TOPCon cells
- Buffer layer deposition of SnO2 for perovskite-silicon tandem cells
- Intermediate/multi-layer stack deposition for tandem solar cells
- Cell encapsulation with Al2O3 layer
This system is ideally suited for passivating PERC and TOPCon cells, and multi-layer stacks for advanced perovskite-silicon tandem solar cells. Wafer substrates are transported without contact on a thin gas bearing, heated fast conductively with very low imposed thermal budget, and processed at atmospheric pressure without the need for vacuum systems.

Processes
Passivation
Buffer layer
Multi-layer stack
Encapsulation
Features and Benefits
- High throughput (up to 6000 wafers/hour)
- Spatial Atomic Layer Deposition (s-ALD)
- High-quality, conformal, dense layers with nanometer-level thickness control
- Uniform single-side ALD deposition including Al₂O₃, TiO₂, and SnO₂
- Configurable up to G12 size for crystalline silicon (c-Si) cells
- Process at atmospheric pressure; no vacuum pumps required
- Contactless wafer transport on floating gas layer (no surface damage)
- Configurable with inline automation; single-cassette, or multi-cassette configurations suitable for pilot lines and full scale production.
