Almere, The Netherlands – August 28, 2025 – LEVO SiC RTA – Rapid Thermal Annealing system for Advanced SiC Processing
Levitech’s LEVO SiC RTA system is designed to meet the diverse thermal processing needs of SiC device manufacturing. Built for today’s SiC production challenges, the LEVO SiC RTA system ensures precise, uniform, and repeatable annealing results.
- Optimized RTA for a wide range of SiC applications
- Compatible with both 6″ and 8″ wafers
- Scalable for High-Volume production and R&D
Whether you are running High-Volume production or developing next-generation devices, the LEVO SiC RTA system offers the precision and flexibility to fit your process needs and support your SiC roadmap!
Meet us at ICSCRM 2025 (September 14–19, Busan, South Korea) at booth #065 and let’s discuss how our solutions can accelerate your next step in SiC manufacturing.
(Images: Wafer processing inside the LEVO SiC RTA system – Grenoble demo lab
📍 Booth 065
📅 September 14–19, 2025
📍 BEXCO, Busan, South Korea
