Atomic Layer Deposition (ALD)

The Levitrack ALD-system is designed to deposit Al2O3 layers of atomic thicknesses at mass-production volume, to provide passivation which in turn increases the efficiency of solar cells. In both the Levitor and Levitrack systems, wafer-substrates are introduced into their respective process-chambers while floating on a very thin gas layer, enabling conductive heating. After achieving process temperature through conductive heating, the substrates glide without contact or force through a series of ALD deposition cells. Each cell contains two precursors, which are separated in space by a nitrogen purge (acting as inert gas curtains). The wafer is then rapidly cooled down using the same conductive heating principle.