Levitrack ALD system became system of choice for N-type solar cell high volume manufacturing

Levitrack ALD system became system of choice for N-type solar cell high volume manufacturing

Almere, the Netherlands – November 30, 2016 – For the manufacturers of N-type cells, the Levitrack HP system has become the system of choice. As such, the Levitrack HP was chosen by a leading Japanese cell maker for its high volume manufacturing of N-type cells. The 2nd generation system Levitrack HP shows a strong performance at low operation costs and the optimization of reactor design allows to process wafers with different thickness and large tolerance to wafer bow. A proprietary HP coating of the reactor walls makes maintenance easier and the maintenance interval is increased up to 500,000 wafers. High uptimes combined with a steady wafer transport makes the system reliable and trustworthy. “The Levitrack HP has shown that the long-term reliability performs according to expectations, the system manufacture solar cells in high volume production for over one year.” says Jaap Beijersbergen, CEO of Levitech. “ALD AL2O3 layer deposited by Levitrack HP provides excellent surface passivation for N-type cells. More and more solar cell manufacturers see the advantages of ALD aluminum oxide above PECVD.”

(Download will be available in January 2017. Article ‘Industrial Optimization of Al2O3 Passivation Layers in New Cell Designs: a Comparison between PECVD and ALD’ is submitted to The Japanese Journal of Applied Physics)